SXR Specifications

Time-resolved spectroscopy and scattering with ultrafast and ultraintense soft X-rays at the LCLS

X-ray Emission Spectroscopy (XES)

X-ray Photoelectron Spectroscopy (XPS)

X-ray Absorption Spectroscopy (XAS)

Coherent Imaging and Fourier Transform Holography​

Reflectivity via Pump-Probe techniques

Diffraction

Resonant Inelastic X-ray Scattering (RIXS)

A wide range of experimental setups in UHV and HV conditions including liquid or highly ionized plasmas

1 Hz, 10 Hz, 30 Hz, 60 Hz and 120 Hz, Burst Mode or Single Shot

60-200 fs for normal operation and ~10 fs for special low charge mode

1 x 10¹³

​Linear in normal operation. Circular polarization with DELTA undulator possible with >10¹¹ photons/pulse. Please contact the beamline scientist for details.

​Available between 500-1000 eV, with λ/Δλ > 5000 and pulse energy up to 100 μJ. Please contact the beamline scientist for details.

​Possible two-pulse modes are described here. Please contact the beamline scientist for details.

1 x 1 mm (unfocused at sample)

= 2 x 2 μm

= 2 x 2 μm

280-2000 eV

grating 1 
(100 lines/mm):
500-1500 eV

grating 2 
(200 lines/mm):
800-2000 eV

~0.1 eV (500 eV)

~0.5 eV (500 eV)

~0.1 eV (500 eV)

~0.2 eV (1000 eV)

~1.0 eV (1000 eV)

~0.5 eV (1000 eV)

~0.6 eV (2000 eV)

~2.0 eV (2000 eV)

~0.6 eV (2000 eV)

1 x 10¹² (500 eV)

1 x 10¹¹ (500 eV)

1 x 10¹⁰ (500 eV)

1 x 10¹³ (1000 eV)

1 x 10¹² (1000 eV)

3 x 10¹² (1000 eV)

1 x 10¹³ (2000 eV)

1 x 10¹² (2000 eV)

2 x 10¹² (2000 eV)

20 mJ at 800 nm

20 mJ at 800 nm

25 mJ at 800 nm 
(uncompressed)

25 mJ at 800 nm (uncompressed)

4-5 mJ at 400 nm

1 mJ at 266 nm

1 mJ at 266 nm

NA

~100 μJ at 4-10 microns

(~70 μJ for longer wavelengths and ~120 μJ for shorter)

NA

~ 50 μJ at 10^-17 microns 

(~ 40 μJ for longer wavelengths and ~ 70 μJ for shorter)

NA

~ 15 μJ at 75-1500 microns (4 to 0.2 THz)

Using LiNbO₃ and DAST we have measured energies up to 30 μJ for 0.6 THz peak field and 5 μJ for 2 THz peak fields, but note these are still being developed.

35-150 fs at 800 nm

35-150 fs at 800 nm

150 ps at 800 nm 
(uncompressed)

150 ps at 800 nm (uncompressed)

50-100 fs at 400 nm

50-100 fs at 400 nm

NA

100-200 fs at 4-10 microns

NA

100-200 fs at 10-17 microns

NA

~ 1 ps at 75-1500 microns (4 to 0.2 THz)

1 mm (1/e²)

50 µm (1/e²)

A fast shutter to quickly turn on or off the beam or to select individual LCLS X-ray pulses. Closes or opens in <8 ms. The fast shutter is up stream of the first experimental position.

A class II alignment laser beam coaxial with the FEL beam at the Endstation Position, to facilitate the positioning of samples in the FEL beam.

Along the instrument exist various pop-in YAG screens to observe the X-ray beam distribution with live video cameras.

Using the transmission sample system with thin samples, the spectrum can be viewed through a sample in transmission on a shot-by-shot basis.

A thin transmissive film can be inserted before the KB system in situ for relative intensity monitoring.

The timetool measures the relative arrival times between the X-ray and optical pulses on a shot-to-shot basis and provides <100 fs timing resolution. Available when using the un-attenuated X-ray beam.

The gas detector provides shot to shot measurements of the number of photons in each pulse from 5 μJ to 5 mJ with 4-6% absolute uncertainty.