MeV-UED Endstations
Instruments
- chemRIXS/qRIXS
- CXI - Coherent X-ray Imaging
- MEC - Matter in Extreme Conditions
- MFX - Macromolecular Femtosecond Crystallography
- TMO - Time-resolved AMO
- TXI - Tender X-ray Instrument
- XCS - X-ray Correlation Spectroscopy
- XPP - X-ray Pump Probe
- SLAC MeV-UED
- LCLS-II-HE Instruments
- CXI Upgrade
- MFX Upgrade
- DXS – Dynamic X-ray Scattering
- XPP Upgrade
- Instrument Maps
- Standard Configurations
Top Links
LCLS Instruments
The SLAC UED system supports multiple different sample chambers optimized for different type of sample delivery. Please note that not all endstations are currently available for the general User Program, e.g., liquid phase chemistry.
Solid State (Materials) & Warm Dense Matter (Single Shot) Endstation | |
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Sample motion | 5-axis sample motion Transverse to beam: X (horz): 50 mm (5 um resolution) Y (vert): 25 mm (0.1 um resolution) Along beam: Z (horz): 25 mm (5 um resolution) Rotations: Yaw (about Y): +/- 45 degrees Pitch (about X): +/- 45 without cooling; +/- 15 with cooling. |
Sample Cooling | 30 - 300 K |
Diagnostics | Frosted YAG for electron/laser overlap Single-crystal gold for q reference Si temperature sensor Bi for time-zero reference |
Sample mounting | TEM mesh grids TEM Si3N4 membranes Si3N4 membrane arrays (contact) |
Vacuum | <1 x10-7 Torr |
UED Gas Phase Endstation | |
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Sample Temperature Range | Sample reservoir: RT - 100 °C (flow cell) & RT - 150 °C (pulsed nozzle) Transport line : RT - 80 °C (flow cell) & RT - 180 °C (pulsed nozzle) Pulsed nozzles : RT - 200 °C Flow cell: RT to ~ 100 °C |
Sample Vapor Pressure Requirement | > 100 torr at 150 °C for pulsed valves > 0.5 torr at RT for flow cell (3 to 4 mm path length) |
Sample Reservoir Size | 100 mL (e.g. standard 2.75 CF nipple) |
Buffer Gas (optional) | Helium, 5 bar for Parker general valve |
Nozzle Properties | Pulsed, up to 180 Hz 100 - 200 µm orifice Typical opening time: 100 - 300 µs |
Gas Jet Size (FWHM) | 200-400 µm |
Nozzle motion | 3-axis translational motion X (Horizontal in lab, perpendicular to beam propagation direction): 2" Y (Vertical in lab): 2" Z (Horizontal in lab, beam propagation direction): 2" |
Cold Trap Temperature | < 100 K |
Diagnostics | Frosted YAG for electron/laser overlap Single-crystal Au/Si for Q reference and time zero reference (within 400 fs) |
Pump-probe propagation angle | ~2° |
Vacuum | Operation condition: Flow cell operates at 1-10 Torr Background pressure ~1e-5 - 1e-4 |
Gas Line Material | Stainless Steel |
Nozzle Puppet/Seal Materials | Vespel (Parker general valve; series 9) Polyimide (for high repetition rate valves) |
Flow cell materials | (1) Stainless steel (2) Macor ceramic |
Q range | 0.5 to 12 Å-1 |
Q resolution (FWHM) | 0.17 Å-1 |
Time resolution (FWHM) | 150 fs |
Pump Wavelength | 200 nm, 266 nm, 400 nm, 800nm, 240 nm - 2 µm tunable |
Delay Stage Range | 2 ns |
Delay Stage Resolution | 7 fs |
MeV-UED Contact Info
Alex Reid
MeV-UED Instrument Lead Scientist
(650) 926-7467
alexhmr@slac.stanford.edu
Mike Minitti
Director, MeV-UED
(650) 926-7427
minitti@slac.stanford.edu
Joel England
UED Accelerator Lead
(650) 926-3706
england@slac.stanford.edu
Xiaozhe Shen
UED Facility R&D Lead
(650) 926-2899
xshen@slac.stanford.edu
Ming-Fu Lin
Associate Staff Scientist
(650) 926-2586
mfucb@slac.stanford.edu
Matthias Hoffmann
Laser Scientist
(650) 926-4446
hoffmann@slac.stanford.edu
Patrick Kramer
Laser Scientist
(650) 926-5148
pkramer@slac.stanford.edu
Xinxin Cheng
Associate Staff Scientist
xcheng@slac.stanford.edu
Fuhao Ji
Associate Staff Scientist
(650) 926-4678
fuhaoji@slac.stanford.edu
Stephen Weathersby
UED Area Manager
(650) 926-3890
spw@slac.stanford.edu