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XPP Specifications

Scientific Capabilities

Scientific Applications

Femtosecond Structural Dynamics

X-ray Interactions with Matter

X-ray Techniques

Wide Angle X-ray Scattering/Diffraction

Small Angle X-ray Scattering

X-ray Absorption Spectroscopy

X-ray Emission Spectroscopy

Atto-second X-ray

 

XPP Schematic
XPP Schematic

Source Parameters

Undulator

28 planar hybrid undulators (30 mm gap)

Source Size

~ 40 microns FWHM

Repetition Rate

Single pulse, 0.5, 1, 5, 10, 30, 60, 120 Hz

Pulse Duration

40 fs (nominal)

100-200 fs in chirped beam mode

< 20 fs in short pulse mode

Pulse Energy

2 mJ nominal

~ 0.5 mJ in chirped beam mode

0.2 mJ in short pulse mode

Bandwidth

~ 0.1% in nominal and short pulse mode (example spectra)

Up to 1% in chirped beam mode (example spectra)

Harmonic Content

~1% for 3rd Harmonic

Polarization

Vertical (from the undulators), horizontal and circular (with a diamond phase retarder)

 

XPP Photon Beam Properties

Energy Range

4-25 keV (fundamental)

10-25 keV (harmonics)

Beam Size

~ 0.5 mm FWHM (unfocused)

Down to 3 x 3 μm FWHM focused (Beryllium lenses)

Energy Resolution (ΔE/E)

Main beamline monochromator Silicon (111): 1.4 x 10-4 ,

Postmono(High quality channelcut crystal) Si(440):0.1 x 10-4, Si(660):0.03 x 10-4

Beamline Control

UNIX Workstation, Linux PC, VME-based EPICS control system, Python based control software

Photon flux at 9.5 keV

20 uJ (no-multiplex), 2uJ(10% multiplex (standard)), 5 uJ(25% multiplex (upon request))

10 uJ(10% multiplex + self-seed option)

 

Optical Laser Properties

Wavelength

800 nm fundamental (nominal)

Harmonic Crystals (400 nm, 266 nm)

OPA (478-590 nm)

Other wavelengths (Intense THz, Mid-IR) availible upon request

Pulse Energy

10 mJ (800 nm)

1 mJ (400 nm)

0.3 mJ (266 nm)

OPA (> 50 μJ)

Pulse Duration

45 fs FWHM

Up to 5 ps chirped

Timing

~ 200 fs FWHM time resolution

~ 0.5 ps/hr stability
~30-50 fs resolution and drift correction possible using timing diagnostics, application is dependent on experimental setup. 

Detectors

ePix10k 2M

1470 x 1470 pixels

100 x 100 μm2 pixel size

1 photon sensitivity at 8 keV

104 per pixel dynamic range at 8 keV

120 Hz readout rate

ePix100

388 x 370 pixels

50 x 50 μm2 pixel size

single photon sensitivity at 8 keV

102 per pixel dynamic range at 8 keV

120 Hz readout rate

Jungfrau1M (0.5M)

1024 x 1024 (1024 x 512) pixels

75 x 75​ μm2 pixel size

1 photon sensitivity at 8 keV

104 per pixel dynamic range at 8 keV

120 Hz readout rate

 

Diagnostics

Relative Intensity Monitor

~0.5% with > 0.2 mJ incident pulse energy

XPP CONTACTs

Takahiro Sato

XPP Instrument Lead
(650) 926-3749
takahiro@slac.stanford.edu

Adam White

Area Manager
(650) 926-4778
adamwh@slac.stanford.edu

Roberto Alonso-Mori

Spectroscopy Scientist
(650) 926-4179
robertoa@slac.stanford.edu

Diling Zhu

Methologist/X-ray Optics Scientist
(650) 926-2913
dlzhu@slac.stanford.edu

Matthieu Chollet

Staff Scientist
(650) 926-3458
mchollet@slac.stanford.edu

Sanghoon Song

Staff Scientist
(650) 926-2255
sanghoon@slac.stanford.edu

Yanwen Sun

XPCS/X-ray Optics Scientist
(650) 926-2562
yanwen@slac.stanford.edu

Hasan Yavas

IXS /RIXS Scientist
(650) 926-3084
yavas@slac.stanford.edu

Matthias Hoffmann

Laser Scientist
(650) 926-4446
hoffmann@slac.stanford.edu

Ying Chen

Mechanical Engineer
yingchen@slac.stanford.edu

Vincent Esposito

Controls & DAQ Engineer
(650) 926-3410
espov@slac.stanford.edu

Daniel Stefanescu

Technical Advisor
(650) 926-3662
daniel@slac.stanford.edu

-

XPP Control Room
(650) 926-1703
XPP Hutch
(650) 926-7463

XPP LOCATION

XPP location
Near Experimental Hall (NEH), Hutch 3
Complete LCLS Instrument Map
Complete Instrument Map

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