MEC Specifications
Specifications
Instruments
- chemRIXS/qRIXS
- CXI - Coherent X-ray Imaging
- MEC - Matter in Extreme Conditions
- MFX - Macromolecular Femtosecond Crystallography
- TMO - Time-resolved AMO
- TXI - Tender X-ray Instrument
- XCS - X-ray Correlation Spectroscopy
- XPP - X-ray Pump Probe
- SLAC MeV-UED
- LCLS-II-HE Instruments
- CXI Upgrade
- MFX Upgrade
- DXS – Dynamic X-ray Scattering
- XPP Upgrade
- Instrument Maps
- Standard Configurations
MEC Source Parameters
Photon Energy | 2.5-25 keV for 1st harmonic* |
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Up to 25 keV for 2nd and 3rd harmonic* | |
Source Size | 60 x 60 µm2 (HxV) FWHM @ 8.3 keV |
Source Divergence | 2 x 2 µrad2 (HxV) FWHM @ 8.3 keV |
Repetition Rate | 120 Hz |
Pulse Duration | 60 - 300 fs (high charge mode) |
<10 fs (low charge mode) | |
Pulse Energy | 1-3 mJ (high charge mode) |
~ 0.2 mJ (low charge mode) | |
Photons per Pulse | ~1 x 1012 (high charge mode @ 8.3 keV) |
~1 x 1011 (low charge mode @ 8.3 keV) | |
Focusing Capability | Lens stacks appropriate to given photon energy. Tuned from a couple of microns to several tens of microns by moving target out of focus. |
Unfocused Beam Size (8 keV) | Up to 1,000 x 1,000 µm2 FWHM @ 8.3 keV |
Energy Resolution ΔE/E | ~0.2% (bandwidth of LCLS beam) |
1.4 x 10-4 (with a Si(111) monochromater) | |
Beamline Transmission | Depends on photon energy, 10% (4 keV) - 40% (8 keV) |
* Energies below 4 keV are in principle usable but the beam size at the end station is large leading to reduced flux. Fundamental goes to 25 keV and both fundamental and harmonics are cut off by the HOMS transport mirrors common to all hard X-ray instruments.
Long Pulse Laser System
Technology | Frequency Doubled Nd:Glass system |
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Wavelength | 527 nm |
Pulse Length | 5 - 35 ns ("best effort" for pulse duration down to 2 ns) |
Pulse Energy on Target | 4 arms polarization multiplexed into two beams with energy depending on pulse length and shape: each arm up to 15 J at 527 nm in 10 ns square pulse. Contact MEC staff for details. |
Repetition Rate | 7 minutes (3.5 minutes for one beam interleaved; pulse shaping quality may be reduced) |
Focusing Capability |
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Short Pulse Laser System
Technology | Ti:Sapphire CPA laser system |
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Wavelength | 800 nm (400 nm also available) |
Pulse Length | 40 fs |
Pulse Energy on Target at 800 nm | 1 J (at 5 Hz), 10 mJ (at 120 Hz) |
Repetition Rate | 5 Hz |
ASE Contrast | >108 |
Focusing Capability |
f/6 OAP in standard delivery, <10 µm FWHM focus; Other OAP focal lengths available for non-standard beam delivery |
Diagnostics
X-ray Thomson Scattering Spectrometers |
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Pixel Array Detectors (updating) |
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XUV spectrometer |
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Line imaging VISAR |
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X-ray Transmission Crystal Spectrometer |
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Alignment diagnostics |
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MEC Links
MEC Contact Info
Eric Galtier
Scientist (Instrument Lead)
(650) 926-6227
egaltier@slac.stanford.edu
Ariel Arnott
Area Manager (Instrument)
(650) 926-2604
amarnott@slac.stanford.edu
Jonathan Ehni
SEA (Instrument)
(650) 926-4562
jonehni@slac.stanford.edu
Dimitri Khaghani
Scientist (Instrument)
(650) 926-5009
khaghani@slac.stanford.edu
Hae Ja Lee
Scientist (Instrument)
(650) 926-2049
haelee@slac.stanford.edu
Bob Nagler
Scientist (Instrument)
(650) 926-3810
bnagler@slac.stanford.edu
Philip Heimann
Scientist (Instrument, X-ray Beam Delivery)
(650) 926-8772
paheim@slac.stanford.edu
Eric Cunningham
Scientist (Lasers)
(650) 926-2548
efcunn@slac.stanford.edu
Marc Welch
Engineer (Lasers)
(650) 926-3754
mwelch@slac.stanford.edu
Gilliss Dyer
Scientist (MEC Dept Head)
(650) 926-3414
gilliss@slac.stanford.edu
Control Room: (650) 926-7970
MEC Hutch: (650) 926-7974
Vestibule: (650) 926-7976