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CXI Specifications

CXI beam directions
CXI Schematic

Scientific Capabilities

Applications

  • Coherent X-ray imaging on single sub-micron particles
  • Serial Femtosecond Crystallography
  • High Fluence X-ray interactions with matter
  • Time-resolved imaging and scattering with hard X-rays
  • Matter in Extreme Conditions
  • Atomic, Molecular and Optical Science
  • Gas Phase Chemistry

Techniques & Scattering Geometry

  • Forward scattering on fixed-mounted samples, free-standing injected particles and in liquid jets
  • Back-scattering
  • Ion Time-of-flight
  • Small Angle X-ray Scattering
  • Wide Angle X-ray Scattering
  • X-ray Emission Spectroscopy

*Ongoing R&D, please contact mliang@slac.stanford.edu for feasibility. All expected performance values are based off a best effort basis.

Source Parameters

Photon Energy

5-25 keV

Source Size

60 x 60 µm2 (H x V) FWHM @ 8.3 keV

78 x 78 µm2 (H x V) FWHM @ 2 keV

Source Divergence

2 x 2 µrad2 (H x V) FWHM @ 8.3 keV

~7 x 7 µrad2 (H x V) FWHM @ 2 keV

Repetition Rate

120 , 60, 30, 10 Hz, Single shot mode

Pulse Duration

10-300 fs (high charge mode)

<10 fs (low charge mode)

Pulse Energy

1-3 mJ  (high charge mode)

~ 0.2 mJ  (low charge mode)

Photons per Pulse

~1 x 1012 (high charge mode @ 8.3 keV)

~1 x 1011 (low charge mode @ 8.3 keV)

* Energies below 5 keV are in principle usable but the beam size at the end station is large leading to poor focusing performance and reduced flux. Also, the detector efficiency drops rapidly below 5 keV.

Photon Beam Properties

Focusing Capability

KB1 mirrors (1.3 µm focus)

KB01 mirrors (~100 nm focus)

Beryllium Lenses in Hutch 5 (~1 µm focus)

Beam Size at Sample (8 keV)

(Calculated for perfect optics)

1.3 x 1.3 µm2 FWHM with 1 micron KB pair (KB1)

90 x 150 nm2 FWHM (V x H) with 100 nm KB pair (KB01)

~1 x 1 µm2 FWHM with Hutch 5 Be Lenses

750 x 750 µm2 FWHM unfocused beam

Beam Divergence

(Calculated for perfect optics)

0.12 x 0.12 mrad2 FWHM with 1 micron KB pair (KB1)

2 x 1 mrad2 FWHM (V x H) with 100 nm KB pair (KB01)

170x 170 µrad2 FWHM with XRT Be Lenses

~0.3 x 0.3 mrad2 FWHM with Hutch 5 Be Lenses

2 x 2 µrad2 FWHM unfocused beam

Energy Range

5-11 keV (kB Mirror Optics)

11-25  keV (Be Lens Optics)

Energy Resolution ΔE/E

~0.2% (bandwidth of the LCLS beam)
No monochromator currently

Sample Environment & Detector

Sample Environment

High vacuum: 10-7 Torr

Fixed sample on grids at room temperature

Possible to operate at atmospheric pressure with limitations on use of some CXI equipment

Particle Injector

Free-standing nanoparticles delivered to the beam using an aerodynamic lens particle injector

User-provided injectors can be incorporated into the system

Liquid jet to delivered samples in hydrated conditions

Detectors

Jungfrau 4M

  • 2-Dimensional pixel array detector, 75 x 75 µm2 pixel size

  • Single photon sensitivity, 104 dynamic range at 12 keV

  • Primary detector for forward scattering

Cornell-SLAC Pixel Array Detector (CSPAD)

  • 1516 x 1516 pixels

  • 2-Dimensional pixel array detector, 110 x 110 µm2 pixel size

  • Single photon sensitivity, 103 dynamic range at 8.3 keV

  • 120 Hz operation

  • Dedicated to parasitic Serial Sample Chamber – used in tandem with Jungfrau for SAXS/WAXS

ePix10k – small area detector for flexible placement

  • 100 x 100 µm2 pixel size

  • Single photon sensitivity, 104 dynamic range at 8 keV

  • Dedicated to parasitic Serial Sample Chamber – used in tandem with Jungfrau for SAXS/WAXS

CSPAD 140K

  • 380 x 380 pixels 

  • Small version of CSPAD available for miscellaneous use

Short Pulse UV Laser

In order to improve the overall time resolution of ultrafast X-ray scattering measurements performed at the CXI instrument, the UV capabilities of the CXI laser are being upgraded to produce shorter pulses. 

This is being done in 2 stages: first the 3rd and 4th harmonics (267 nm and 200 nm, respectively) of the Ti:sapphire laser are being improved by increasing the spectral bandwidth and minimizing the dispersion of the travelling pulses. 

In a second phase of upgrade, an OPA and a variety of sum frequency generation schemes will be used to generate tunable pulses in the 185-265 nm range.

Phase 1: Improving the time resolution of the 3rd and 4th harmonics

 

Current Pulse Width
(FWHM)

Expected Performance
(FWHM)

267 nm (3ω)

~80 fs

~35 fs

200 nm (4ω)

~120 fs

~50 fs

Phase 2: Generating tunable deep UV pulses

 

Current Capability

Target Capability

245-260 nm

Available Run 22

~35 fs

220-245 nm

Possible for Run 22*

~40 fs

280-330 nm

Possible for Run 22*

~35 fs

CXI TECHNICAL SPECIFICATIONS

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Download Specifications

CXI CONTACTS

Meng Liang

CXI Instrument Lead
(650) 926-2827
mliang@slac.stanford.edu

Matt Hayes

Area Manager
(650) 926-3060
hayes@slac.stanford.edu

Joe Robinson

Lead Laser Scientist
(650) 926-5190
jsrob@slac.stanford.edu

Michael Minitti

Senior Scientist
(650) 926-7427
minitti@slac.stanford.edu

Andy Aquila

Staff Scientist
(650) 926-2682
aquila@slac.stanford.edu

Xinxin Cheng

Staff Scientist
(650) 926-3156
xcheng@slac.stanford.edu

Sandra Mous

Staff Scientist
(650) 926-6225
smous@slac.stanford.edu

Kirk Larsen

Associate Laser Scientist
(650) 926-3728
larsenk@slac.stanford.edu

Philip Hart

Detectors Engineer
(650) 926-2813
philiph@slac.stanford.edu

Stella Lisova

Sample Delivery Engineer
(650) 926-3272
stellal@slac.stanford.edu

Divya Thanasekaran

Controls Engineer
(650) 926-8917
divya@slac.stanford.edu

Serge Guillet

Staff Engineer
(650) 926-4771
sguillet@slac.stanford.edu

Kelsey Banta

Science & Engineering Associate
(650) 926-3819
banta@slac.stanford.edu

-

CXI Control Room
(650) 926-6295
(650) 926-6296
(650) 926-6297
(650) 926-6298
CXI Hutch
(650) 926-6291

CXI LOCATION 

CXI location in Far Experimental Hall (FEH), Hutch 5
Far Experimental Hall (FEH), Hutch 5
Complete LCLS Instrument Map
Complete Instrument Map

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Beamline Specifications

Diagnostics Stand in the X-ray Tunnel

Devices

  • Pulse Picker
  • Attenuators (10 filters)
  • X-ray Focusing Lenses

Purpose

  • Rapidly shutter the X-ray beam
  • Control the incident beam intensity
  • Pre-focus the X-ray beam or produce a ~10 micron focus at CXI

Diagnostics Stand 1

Devices

  • Reference Laser
  • Slits 1
  • Profile-Intensity Monitor
  • Differential Pump

Purpose

  • Produce a visible reference line for alignment
  • Slit the beam down and reduce unwanted halo, Define the beam entering the KB mirrors
  • Measure the incidnet beam profile entering the CXI hutch
  • Separate the vacuum of the KB mirrors from the upstream beamline

0.1 micron KB Mirrors

Devices

  • 100 nm KB mirrors

Purpose

  • Focus the X-ray beam to a ~100 nm spot

1 micron KB Mirrors

Devices

  • Slits 2
  • 1 micron KB mirrors
  • Slits 3

Purpose

  • Slit the beam down and clean the beam before entering the KB mirrors
  • Focus the X-ray beam to a ~1 micron spot
  • Slit the beam down and clean the beam entering the KB01 mirrors or the beam exiting the KB1 mirrors

0.1 micron Sample Chamber

Devices

  • 100 nm interaction region

Purpose

  • Location of the ~100 nm focus

Detector Stage (A location)

Devices

  • Full size CSPAD
  • X-ray Focusing Lenses
  • Attenuator or beam stop

Purpose

  • Forward scattering measurements with the nanofocus chamber
  • Refocusing or collimating the 100 nm focus for reuse downstream
  • Attenuate the beam passing through the CSPAD hole or block it entirely

Diagnostics Stand 2

Devices

  • CSPAD 140K or X-ray Focusing Lenses
  • Slits 4
  • Intensity-Position Monitor
  • Profile-Intensity Monitor
  • Differential Pump

Purpose

  • Measure the low angle forward scattering from the 100 interaction region

OR

  • Change the divergence of the 1 micron KB beam and control the spot size in SC1
  • Slit the beam down after the refociusing lenses or clean the beam before after the 1 micron KB mirrors
  • Non-destructive relative measurement of the pulse intensity
  • Measure the beam profile on the way to the 1 micron focus, after the 100 nm focus or after the refocusing lenses
  • Isolate the 1 micron sample chamber environment from the upstream part of the beamline

Detector Stage (B location)

Devices

  • Full size CSPAD

OR

  • Time Tool
  • Pulse Selector
  • Attenuators (6 filters)
  • Slits 5
  • Differential Pump

Purpose

  • Back scattering measurements with the 1 micron focus

OR

  • Cross-correlate the arrival time of the X-rays and pump lasers
  • Rapidly shutter the X-ray beam or control the repetition rate for SC1
  • Control the incident beam intensity
  • Slit the beam down after the refocusing lenses or clean the beam before after the 1 micron KB mirrors
  • Isolate the 1 micron sample chamber environment from the upstream part of the beamline

1 micro Sample Chamber

Devices

  • 1 micro Sample Chamber

Purpose

  • Location of the ~1 micron focus and of the refocused 100 nm beam

Detector Stage (C location)

Devices

  • Full size CSPAD (Front detector for SC1)
  • Attenuator or beam stop
  • Pulse Selector for refocused 1 micron beam
  • X-ray focusing lenses for refocusing or collimating the 1 micron focus

Purpose

  • Forward scattering measurements with the micron focus chamber (High angle detector)
  • Attenuate the beam passing through the CSPAD hole or block it entirely
  • Rapidly shutter the X-ray beam or control the repetition rate for SSC
  • Refocusing or collimating the 1 micron focus for reuse downstream

Serial Sample Chamber

Devices

  • Interaction for refocused 1 micron beam

Purpose

  • Location of the refocused 1 micron beam

Detector Stage (D location)

Devices

  • Full size CSPAD (Back detector for SC1)

OR

  • Full size CSPAD (Detector for SSC)
  • Attenuator or beam stop

Purpose

  • Forward scattering measurements with the micron focus chamber (Low angle detector)

OR

  • Forward scattering measurements with the refocused beam in SSC
  • Attenuate the beam passing through the CSPAD hole or block it entirely

Diagnostics Stand 3

Devices

  • Single Shot Spectrometer

Purpose

  • Measure the single shot X-ray spectrum

Diagnostics Stand 4

Devices

  • Intensity-Position Monitor
  • Profile-Intensity Monitor

Purpose

  • Non-destructive relative measurement of the pulse intensity
  • Measure the beam profile at the end of the CXI hutch, after all focusing optics and all interactions with samples or diagnostics
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